Project Name: Construction Project of High end Semiconductor Mask Production Base

Project location:Nanhai District, Foshan City

Industry positioning:Semiconductor high-end mask plate

Building scale:About 30000 square meters

Service scope:Feasibility Study → Scheme Design → Civil Construction Drawing Design → Process Construction Drawing Design

Key Features:Customized factory building, large area ISO Class 1/10 cleanroom

Confidentiality NoticeThis case involves the client's trade secrets, and it is strictly prohibited to reprint or quote them in any form to the outside world. Violators will be held accountable in accordance with the law.