Project Name: Chip Material Production

Project location:Zhuji, Zhejiang

Building scale:86000 ㎡

Time:2024

Service scope:Whole process design

Main features: 1. SiC trays for LED chip epitaxy, silicon single crystal epitaxy trays, thermal field components for silicon carbide epitaxy equipment, silicon-based gallium nitride epitaxy trays, single crystal silicon pulling single crystal thermal field components, silicon carbide coating products for the photovoltaic industry, etc; 2. The workshop clean room includes levels 10000 and 1000.

Confidentiality NoticeThis case involves the client's trade secrets, and it is strictly prohibited to reprint or quote them in any form to the outside world. Violators will be held accountable in accordance with the law.